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UltraFast Innovations (UFI) 2μm Highly-Dispersive Broadband Ultrafast Mirrors

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  • Reflectivity >99.9% Between 2000 - 2200nm
  • GDD of -1000fs2 @ 5° AOI
  • Ideal for <100fs Pulse Compression of Thulium and Holmium Lasers
  • Broadband Ultrafast Chirped Coating

UltraFast Innovations (UFI) 2μm Highly-Dispersive Broadband Ultrafast Mirrors feature an ultrafast chirped coating and are designed for pulse compression of Thulium (Tm) and Holmium (Ho) lasers, as well as for intracavity dispersion compensation. These mirrors have a high negative group delay dispersion (GDD) of -1000fs2 at a 5° angle of incidence (AOI), allowing for pulse compression <100fs. With low loss reflectance >99.9% (P-polarization) between 2000 - 2200nm, these 2 micron mirrors have an absolute reflectance reaching >99.95%. UFI 2μm Highly-Dispersive Broadband Ultrafast Mirrors are ideal for use inside 2μm thin-disk laser oscillators due to their excellent spectral performance, low loss, and proven GDD. These highly-dispersive mirrors are available in two standard sizes of 12.7mm and 25.4mm diameters and are ideal for integration into femtosecond laser systems.

Common Specifications

Typical Applications:
Thulium and Holmium Lasers
Wedge (arcmin):
10
Clear Aperture (%):
80
Back Surface:
Commercial Polish
Thickness (mm):
6.35 ±0.01
Reflection at DWL (%):
>99.95
Reflectivity (Rp%):
99.9
Coating Specification:
Ravg >99.9% @ 2000 - 2200nm (p-polarization)
GDD Specification:
-1000fs2 @ 2000 - 2200nm (p-polarization)
Wavelength Range (nm):
2000 - 2200
Irregularity (P-V) @ 632.8nm:
λ/10
Coating Type:
Dielectric
Coating:
Chirped Ultrafast (2000-2200nm)
Design Wavelength DWL (nm):
2000
Angle of Incidence (°):
5
Substrate:
Fused Silica (Corning 7980)

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Technical Information

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