- Small, <1cm³, Form Factor
- Greater than 70% Minimum Transmission and >30dB Minimum Isolation
- Input Apertures as Low as 1.60mm
- Ideal for High-Power and Ultrashort Pulse Systems
- Fixed Magnifications Available from 1.5X to 8X
- Designed for Diffraction Limited Performance
- Ideal for High-Power and Ultrashort Pulse Systems
- Continuous Magnifications Ranges from 1X to 10X
- Designed for Diffraction Limited Performance
- High Performance Phase Modulation up to 1MHz
- >98% Transmission from UV to NIR Spectra
- >10 J/cm2 Damage Threshold
- Ideal for Q-switching, Pulse Picking, and Laser Power Control
- High Reflectivity at 1030nm and High Transmission at 940nm
- Low Group Delay Dispersion (GDD) <±100fs2
- Dichroic Mirror Ideal for Ytterbium (Yb) Lasers
- Preserves Incident Circular Polarization at 45° AOI
- Up To 99.9% Reflection at 532 or 1064nm, and 80% at 650nm for Alignment
- 12.7, 25.4, and 50.8mm Designs Available
- GDD as Low as ±20fs2 at Design Wavelength Range
- Greater than 99.9% Reflectivity
- Ideal for Ti:sapphire and Yb:doped Ultrafast Lasers
- High Precision Fused Silica Mirror Substrates
- Large Selection of Diameters and Focal Lengths
- Custom Coating Options Available
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